High dense Microelectrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO), with internal reference electrode, electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, without ring
HD30/10iR-ITO-gr
High dense Microelectrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO), with internal reference electrode, electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, glass ring
HD30/10iR-ITO-pr
High dense Microelectrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO), with internal reference electrode, electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, pastic ring without thread
HD30/10iR-ITO-pr-T
High dense Microelectrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO), with internal reference electrode, electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, plastic ring with thread