High dense Micro electrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO)
electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, without ring
HD30/10-ITO-gr
High dense Micro electrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO)
electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, glass ring
HD30/10-ITO-pr
High dense Micro electrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO)
electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, pastic ring without thread
HD30/10-ITO-pr-T
High dense Micro electrode array: Double recording field (500µm in-between fields), TiN electrodes, SiN isolator, contact pads and tracks transparent (ITO)
electrode grid 2x(5x6), 60 electrodes, electrode spacing 30µm, electrode diameter 10µm, plastic ring with thread