Micro electrode array with thin recording field: 180µm thin recording area, Tin electrodes, SiN isolator, ITO conductive strips, with internal reference electrode, electrode grid 8x8, 60 electrodes, electrode spacing 200µm, electrode diameter 30µm, without ring
ThinMEA200/30iR-ITO-gr
Micro electrode array with thin recording field: 180µm thin recording area, Tin electrodes, SiN isolator, ITO conductive strips, with internal reference electrode, electrode grid 8x8, 60 electrodes, electrode spacing 200µm, electrode diameter 30µm, glass ring
ThinMEA200/30iR-ITO-pr
Micro electrode array with thin recording field: 180µm thin recording area, Tin electrodes, SiN isolator, ITO conductive strips, with internal reference electrode, electrode grid 8x8, 60 electrodes, electrode spacing 200µm, electrode diameter 30µm, plastic ring without thread
ThinMEA200/30iR-ITO-pr-T
Micro electrode array with thin recording field: 180µm thin recording area, Tin electrodes, SiN isolator, ITO conductive strips, with internal reference electrode, electrode grid 8x8, 60 electrodes, electrode spacing 200µm, electrode diameter 30µm, plastic ring with thread